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SPIK®1000A |
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SPIK®2000A |
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Descriptions : |
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| For plasma cleaning, plasma activating, plasma etching, PVD- bias, reactive sputtering by single and dual magnetrons configurations, plasma- CVD, plasma diffusion, and plasma nitriding applications |
| Highest plasma density |
| Independent free-adjustable ON and OFF Time Control Factors |
| Quick arc detection and elimination in less than 2 µs |
| Easy to retrofit into your existing dc plasma application |
| Pulse trains by using external Arbitrary Waveform Generator |
Fast DSP control technology, LCD control panel, RS 232 port |
| Versatile operation modes dc+, dc-, unipolar+, unipolar-, bipolar : |
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Symmetric Bipolar Output |
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One DC power supply is required, V dc+ =V dc- |
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Asymmetric Bipolar Output |
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| Two DC power supplies are necessary, Vdc+ ?Vdc- |
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