Outline:
NANO-MASTER offers Megasonic Single Wafer & Mask Cleaning Systems for the state of the art damage-free megasonic cleaning of substrates with the highest resolution patterns by controlling uniform distribution of the acoustic energy density across the entire surface of the substrate. Particle release off the surface is enhanced with chemical dispense and then the released particles are removed from the substrate surface allowing the least number of reattachments by sweeping off with the radial flow of the DI water. This patented technology provides reproducible and uniform cleaning of the wafers, masks, and other delicate substrates with maximum megasonic energy just below the damage threshold of parts to be cleaned.